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2025年5月12日 星期一
农业生物技术学报  2023, Vol. 31 Issue (3): 500-508    DOI: 10.3969/j.issn.1674-7968.2023.03.005
  研究论文与报告 本期目录 | 过刊浏览 | 高级检索 |
褪黑素对半夏高温倒苗及DNA甲基化的影响
崔婉宁1,2, 杨金荣1,2, 刘梦梦1,2, 韩磊1,2, 刘晓1,2, 尤倩1,2, 赵丰兰1,2, 薛涛1,2, 朱艳芳1,2,*, 薛建平1,2,*
1 淮北师范大学 生命科学学院,淮北 235000;
2 安徽省特色资源植物利用工程实验室,淮北 235000
Effects of Melatonin on the Sprout Tumble Under High Temperature and DNA Methylation in Pinellia ternata
CUI Wan-Ning1,2, YANG Jin-Rong1,2, LIU Meng-Meng1,2, HAN Lei1,2, LIU Xiao1,2, YOU Qian1,2, ZHAO Feng-Lan1,2, XUE Tao1,2, ZHU Yan-Fang1,2,*, XUE Jian-Ping1,2,*
1 College of Life Sciences, Huaibei Normal University, Huaibei 235000, China;
2 Anhui Provincial Engineering Laboratory for Efficient Utilization of Featured Resource Plants, Huaibei 235000, China
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摘要 褪黑素广泛参与植物的逆境响应调控,其在半夏(Pinellia ternata)高温倒苗中的功能及调控机制尚不清楚。本研究以'宿半夏'为材料,比较不同浓度褪黑素处理对半夏高温倒苗率的影响,并基于甲基化敏感扩增多态性(methylation-sensitive amplification polymorphism, MSAP)分析褪黑素处理对半夏基因组甲基化变异的影响。结果表明,浓度为50和100 μmol/L的褪黑素均可显著降低半夏的高温倒苗率(P<0.05)。选取效果较好的褪黑素浓度(50 μmol/L)对半夏进行处理,分析其对半夏基因组甲基化变异的影响,发现对照组半夏在高温胁迫0和6 h的总甲基化率分别为56.97%与45.38%,而50 μmol/L褪黑素处理组在高温胁迫6 h的甲基化率为52.11%,表明褪黑素处理总体上延缓了高温胁迫诱导的半夏基因组的去甲基化。分析差异甲基化条带发现,褪黑素处理主要影响半夏线粒体与叶绿体基因组甲基化的修饰;同时发现,半夏过氧化氢酶2 (P. ternata catalase 2, PtCAT2)在褪黑素处理条件下去甲基化,且基因表达量上调,表明褪黑素可通过甲基化修饰调控活性氧的积累,进而参与高温胁迫条件下半夏的倒苗调控。本研究明确了褪黑素调控半夏高温倒苗的功能,并从表观遗传视角解析了其可能的调控途径,为研究半夏的倒苗调控机理提供了理论参考。
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崔婉宁
杨金荣
刘梦梦
韩磊
刘晓
尤倩
赵丰兰
薛涛
朱艳芳
薛建平
关键词 半夏褪黑素倒苗率DNA甲基化甲基化敏感扩增多态性(MSAP)    
Abstract:Melatonin is widely involved in the regulation of plant stress response, however, the function and regulatory mechanism of melatonin in the sprout tumble of Pinellia ternata under high-temperature are unclear. In this study, the effect of melatonin treatment on the rate of sprout tumble in P. ternata were compared and the corresponding genomic methylation variation in P. ternata were analyzed based on methylation-sensitive amplification polymorphism (MSAP). The results showed that both 50 and 100 μmol/L melatonin significantly reduced the sprout tumble rate of P. ternata. And the effect of 50 μmol/L melatonin treatment on the methylation variation of the P. ternata genome was analyzed. The total methylation rate of the control group was 56.97% and 45.38% at 0 and 6 h high temperature stress, respectively, and the methylation rate of 50 μmol/L melatonin-treated group was 52.11% at 6 h high temperature stress, indicated that melatonin treatment generally delayed the high temperature stress-induced demethylation of the genome. The analysis of differential methylation bands revealed that melatonin treatment mainly affected the modification of methylation in the mitochondrial and chloroplast genomes of P. ternata. Additionally, P. ternata catalase 2 (PtCAT2) was demethylated under melatonin treatment, and the gene expression was up-regulated, indicated that melatonin could regulate the accumulation of reactive oxygen species through methylation modification, and then participated in the regulation of sprout tumble in P. ternata under high temperature stress. This study explored the function of melatonin on the sprout tumble of P. ternata under high-temperature, and analyzed its possible regulatory pathways from an epigenetic perspective, providing a reference for the study of the regulation mechanism of the sprout tumble of P. ternata.
Key wordsPinellia ternata    Melatonin    Sprout tumble rate    DNA methylation    Methylation-sensitive amplification polymorphism (MSAP)
收稿日期: 2022-04-23     
ZTFLH:  S609.9  
基金资助:国家自然科学基金(82274048; 81803665); 安徽省高校自然科学研究重点项目(KJ2021A0532; KJ2021A0533); 抗逆育种与减灾国家地方联合工程实验室开放课题(NELCOF20210102)
通讯作者: * yfangok@163.om;xuejp@163.com   
引用本文:   
崔婉宁, 杨金荣, 刘梦梦, 韩磊, 刘晓, 尤倩, 赵丰兰, 薛涛, 朱艳芳, 薛建平. 褪黑素对半夏高温倒苗及DNA甲基化的影响[J]. 农业生物技术学报, 2023, 31(3): 500-508.
CUI Wan-Ning, YANG Jin-Rong, LIU Meng-Meng, HAN Lei, LIU Xiao, YOU Qian, ZHAO Feng-Lan, XUE Tao, ZHU Yan-Fang, XUE Jian-Ping. Effects of Melatonin on the Sprout Tumble Under High Temperature and DNA Methylation in Pinellia ternata. 农业生物技术学报, 2023, 31(3): 500-508.
链接本文:  
http://journal05.magtech.org.cn/Jwk_ny/CN/10.3969/j.issn.1674-7968.2023.03.005     或     http://journal05.magtech.org.cn/Jwk_ny/CN/Y2023/V31/I3/500
 
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