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农业生物技术学报  2020, Vol. 28 Issue (6): 1060-1072    DOI: 10.3969/j.issn.1674-7968.2020.06.012
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Analysis on the Development Trend and Competitive Situation of Plant Gene Editing Technology Based on Patent Information
ZOU Wan-Nong, SONG Min*
Institute of Agricultural Resources and Regional Planning, Chinese Academy of Agricultural Sciences, Beijing 100081; China
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Abstract  Gene editing is a new genetic engineering technology that modify the specific target genes of organism genomes. It has been widely used to edit plant genomes accurately at present to obtain excellent crop varieties. This paper attempts to mine and analyze patent data related to the global plant gene editing technology. On the basis of sorting out the development path of gene editing technology, the focus was on analyzing the development trend and competition situation from the perspective of the main patent layout areas and rights holders, R&D (Research & Development) and industrialization. The analysis found that China's plant gene editing technology patent lacked global patent deployment, and the overall quality and economic value of the patent were relatively low. The final achievements still remained in model crop creation, lack of industrialization mechanism based on intellectual property cooperation. Finally, countermeasures and suggestions were proposed such as strengthening the original innovation of editing system, strengthening the intellectual property layout of the global and whole industrial chain, and promoting intellectual property cooperation to make up for shortcomings.
Key wordsPatents      Gene editing      Plant      Development trend      Competition situation     
Received: 31 October 2019     
ZTFLH:  S336  
Corresponding Authors: *, songmin@caas.cn   
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ZOU Wan-Nong
SONG Min
Cite this article:   
ZOU Wan-Nong,SONG Min. Analysis on the Development Trend and Competitive Situation of Plant Gene Editing Technology Based on Patent Information[J]. 农业生物技术学报, 2020, 28(6): 1060-1072.
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http://journal05.magtech.org.cn/Jwk_ny/EN/10.3969/j.issn.1674-7968.2020.06.012     OR     http://journal05.magtech.org.cn/Jwk_ny/EN/Y2020/V28/I6/1060
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